Abstract :
Nanolithography deals with writing, etching, or printing at the microscopic level, where the dimensions of
characters are in nanometers. This involves a variety of methods of modifying semiconductor chips at the atomic level for
fabricating integrated circuits (ICs). Instruments used in nanolithography include the Atomic Force Microscope (ATM) and
the Scanning Probe Microscope (SPM). The SPM allows surface viewing of the samples in fine detail without necessarily
modifying it. Either the SPM or the ATM can be used to etch, write, or print on a surface in single-atom dimensions. This
paper has a bird’s eye view of various lithographic techniques such as Optical lithography, X-ray lithography, Extreme
ultraviolet lithography (EUV), Magneto lithography, E-beam Nanolithography, Dip Pen Nanolithography. A detailed
account on E-beam Nanolithography is also provided in order to have an insight into Nanolithography.
Keyword :
Nanolithography, Optical lithography, ultraviolet lithography.